4.6 Article

Improvement of dark current using InP/InGaAsP transition layer in large-area InGaAs MSM photodetectors

期刊

IEEE TRANSACTIONS ON ELECTRON DEVICES
卷 51, 期 3, 页码 351-356

出版社

IEEE-INST ELECTRICAL ELECTRONICS ENGINEERS INC
DOI: 10.1109/TEd.2003.822276

关键词

epitaxial layers; metal-semiconductor-metal (MSM) devices; photodetectors; Schottky barriers

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A large-area InGaAs metal-semiconductor-metal (MSM) photodetector with 1 X 1 mm(2) photoactive area for free-space optical communication applications has been designed, fabricated, and characterized. Interdigitated electrodes of 2-mum widths and 15-mum spacings are designed to maximize the responsivity, and enable MSM photodetectors to reach a maximum responsivity at 1.53-mum wavelength. By employing a two-step InP/InGaAsP transition layer, the dark current density of 45 fA/mum(2) was achieved at 10-V bias and at room temperature. Dark current-bias voltage curves were measured as a function of temperature from 40 to 270 K to estimate the activation energy. A 3-dB bandwidth of 210 MHz was obtained at a 10-V bias, and the measured result was compared with the designed bandwidth.

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