期刊
SURFACE & COATINGS TECHNOLOGY
卷 180, 期 -, 页码 238-243出版社
ELSEVIER SCIENCE SA
DOI: 10.1016/j.surfcoat.2003.10.147
关键词
remote plasma deposition; carbon material; hydrogenated/nitrogenated carbon films; emission spectroscopy
Hydrogenated and nitrogenated carbon films were obtained by PECVD with carbon species supplied by acetylene gas injected into an argon or argon/nitrogen remote plasma generated by an expanding radiofrequency discharge. The properties of carbon material like the nature of bonds, morphology, surface topography, crystallinity are presented. The reaction pathways linking the precursors with the depositing species, as revealed by emission spectroscopy, are discussed. (C) 2003 Elsevier B.V. All rights reserved.
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