3.8 Article Proceedings Paper

Atomic scale chemistry of α2/γ interfaces in a multi-component TiAl alloy

期刊

INTERFACE SCIENCE
卷 12, 期 2-3, 页码 303-310

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KLUWER ACADEMIC PUBL
DOI: 10.1023/B:INTS.0000028659.31526.2b

关键词

TiAl; interface; partitioning; proxigram; interfacial excess

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We report on the distribution of micro-alloying elements in a multi-component TiAl-based alloy. The specimen contains 3 at.% Nb, 1.5 at.% Cr, 0.5 at.% Mn, 0.6 at.% (W + Hf + Zr), and 0.2 at.% each of B, C, and O. The distributions of all micro-alloying elements with respect to the heterophase interface between alpha(2) and gamma lamellae are analyzed with a three-dimensional atom-probe (3DAP) microscope. All the elements partition except boron, which resides primarily in boride precipitates. Oxygen, C, Mn, and Cr partition to the alpha(2)-phase, whereas Nb and Zr partition to the. gamma-phase. Both W and Hf exhibit excess concentration values within ca. 7 nm of the lamellar interface in the alpha(2)-phase, and their near interfacial excesses are 0.26 and 0.35 atoms nm(-2), respectively.

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