期刊
PHILOSOPHICAL MAGAZINE
卷 84, 期 10, 页码 1021-1028出版社
TAYLOR & FRANCIS LTD
DOI: 10.1080/14786430310001659480
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We report the development of thermally stable nanoscale layered structures in sputter deposited Cu/Nb multilayered films with 75nm individual layer thickness, vacuum annealed at temperatures of 800 degreesC or lower. The continuity of the layered structure was maintained and layer thickness unchanged in the annealed films. The nanolayers were observed to be offset by shear at the triple-point junctions that had equilibrium groove angles and were aligned in a zigzag pattern. A mechanism is proposed for the evolution of this 'anchored' structure that may be resistant to further morphological instability.
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