UV photopatterning of a highly metallized, cluster-containing poly(ferrocenylsilane)

Thin films of a cobalt-clusterized poly(ferrocenylsilane) have been shown to behave as a negative-tone resist for UV photolithography, allowing access to feature sizes between 20 and 300 mum. Pyrolysis of the patterned polymer at 900 degreesC under a N-2 atmosphere afforded patterned ferromagnetic ceramics with excellent shape retention.