4.7 Article

High thermoelectric performance at low temperature of p-Bi1.8Sb0.2Te3.0 grown by the gradient freeze method from Te-rich melt

期刊

JOURNAL OF ALLOYS AND COMPOUNDS
卷 368, 期 1-2, 页码 44-50

出版社

ELSEVIER SCIENCE SA
DOI: 10.1016/j.jallcom.2003.08.066

关键词

semiconductors; crystal growth; X-ray diffraction; electronic transport; thermoelectricity

向作者/读者索取更多资源

The structural and low-temperature thermoelectric properties were investigated in the temperature range from 4.2 to 300 K of Bi1.8Sb0.2Te3.0 grown by the gradient freeze method from Te-rich melt of Bi1.8Sb0.2Te3.0+delta. The composition profile was determined by electron probe microanalysis (EPMA) measurement to be homogeneous in the center part of the single crystalline ingots. An excess of Te is segregated at the top of the ingots. A high thermoelectric performance was achieved at low temperature in the p-type samples. The largest value of the Seebeck coefficient a of >500 muV K-1 was obtained at 200 K for delta = 0.259 to give ZT = 1.1. The optimum carrier concentration was determined to be n = 1.6 x 10(19) cm(-3) for the highest thermoelectric performance. (C) 2003 Elsevier B.V. All rights reserved.

作者

我是这篇论文的作者
点击您的名字以认领此论文并将其添加到您的个人资料中。

评论

主要评分

4.7
评分不足

次要评分

新颖性
-
重要性
-
科学严谨性
-
评价这篇论文

推荐

暂无数据
暂无数据