One-step lithography for various size patterns with a hybrid mask-mold

Nanoimprint lithography (NIL) has been successfully employed in nanoscale patterning, however, it is known to have limitations in replicating large-scale (hundreds of microns and larger) and nanoscale patterns simultaneously. In this letter, we present a novel lithographic technique that integrates photolithography into the NIL patterning process. This technique uses a hybrid mask-mold that has large metal pads embedded in a transparent NIL mold. Such a hybrid mold allows both large- and nanoscale patterns to be replicated in one step by a combination of imprinting and photolithography. In addition, this new technique offers the advantages of simplifying residual layer distribution and avoiding NIL failures resulting from insufficient polymer flow. (C) 2004 Elsevier B.V. All rights reserved.