期刊
JOURNAL OF THE AMERICAN CHEMICAL SOCIETY
卷 126, 期 19, 页码 6124-6134出版社
AMER CHEMICAL SOC
DOI: 10.1021/ja049570f
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The effect of molecular weight on the solvent-induced self-assembly of mixed poly(methyl methacrylate) (PMMA)/polystyrene (PS) brushes on silicon wafers was studied. For a series of mixed brushes with a fixed PMMA M-n and systematically changed PS M-n, a transition in water advancing contact angle (theta(a)) from 74degrees, the value for a flat PMMA surface, to 91degrees, the value for a flat PS film, was observed with increasing PS M-n after treatment with CHCl3. Atomic force microscopy studies showed smooth surfaces for all samples. While no significant changes in surface morphologies were observed after treatment with cyclohexane, a selective solvent for PS, contact angle and XPS studies indicated that the mixed brushes with a PS M-n slightly smaller than that of PMMA underwent self-reorganization, exhibiting a different theta(a). Intriguing surface morphologies composed of relatively ordered nanoscale domains were found from mixed brushes with PS M-n slightly smaller than or similar to that of PMMA after treatment with acetic acid, a selective solvent for PMMA. The nanodomains are speculated to be of a micellar structure, with PS chains forming a core shielded by PMMA chains.
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