期刊
JOURNAL OF PHYSICS D-APPLIED PHYSICS
卷 37, 期 10, 页码 1472-1477出版社
IOP PUBLISHING LTD
DOI: 10.1088/0022-3727/37/10/009
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Aluminium nitride (AlN) films have been fabricated on Si(100) substrates by an ion-beam-assisted filtered cathodic vacuum arc technique at low temperature. The structural and mechanical properties of the AlN films have been investigated using x-ray photoelectron spectroscopy, by means of an x-ray diffractometer, visible Raman spectroscopy, atomic force microscopy and nanoindentation. The AlN films exhibit a predominant a-axis orientation with hardness as high as 14.5 GPa, which may be suitable for surface acoustic wave devices.
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