期刊
APPLIED SURFACE SCIENCE
卷 231, 期 -, 页码 353-356出版社
ELSEVIER
DOI: 10.1016/j.apsusc.2004.03.093
关键词
gradient shaving preparation; depth profiling; TOF-SIMS CAR; PAG
The gradient shaving preparation was recently introduced as a new pretreatment technique for depth profiling. We can obtain a chemically undamaged slope with a length of several hundred micrometers by shaving linearly for a thickness ranging from a few nanometers to a few hundred nanometers. To analyze the chemical structure in organic compounds we performed depth profiles by doing line analysis along the sloped surface of various probes. In this work, the gradient shaving preparation was applied to analyze a chemically amplified photoresist which contains small amount of photoacid generator (PAG) and other additives by TOF-SIMS. The characteristic distribution of F- and CF3SO3- fragments originated from PAG was determined. It was confirmed that the gradient shaving preparation allows TOF-SIMS depth profiling of small amount of organic materials in polymer films within the static limit. (C) 2004 Elsevier B.V. All rights reserved.
作者
我是这篇论文的作者
点击您的名字以认领此论文并将其添加到您的个人资料中。
推荐
暂无数据