期刊
APPLIED PHYSICS LETTERS
卷 84, 期 26, 页码 5299-5301出版社
AMER INST PHYSICS
DOI: 10.1063/1.1766071
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We report advances in nanoimprint lithography, its application in nanogap metal contacts, and related fabrication yield. We have demonstrated 5 nm linewidth and 14 nm linepitch in resist using nanoimprint lithography at room temperature with a pressure less than 15 psi. We fabricated gold contacts (for the application of single macromolecule devices) with 5 nm separation by nanoimprint in resist and lift-off of metal. Finally, the uniformity and manufacturability of nanoimprint over a 4 in. wafer were demonstrated. (C) 2004 American Institute of Physics.
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