4.2 Article

Generation of nano-sized free standing single crystal silicon particles

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JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B
卷 22, 期 4, 页码 1923-1930

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A V S AMER INST PHYSICS
DOI: 10.1116/1.1771667

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A system has been designed to generate monodisperse, single crystal silicon nanoparticles. The particles are generated using a SiH4/H-2 mixture in a high density plasma. An aerodynamic lens assembly focuses and size selects the particles. A high voltage plate is used to accelerate the charged particles such that they can be injected into a high temperature annealing tube to be heated. The shape and structure of the particles are changed in the annealing tube. Single crystals are obtained. (C) 2004 American Vacuum Society.

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