4.5 Article

Size influence on the propagation loss induced by sidewall roughness in ultrasmall SOI waveguides

期刊

IEEE PHOTONICS TECHNOLOGY LETTERS
卷 16, 期 7, 页码 1661-1663

出版社

IEEE-INST ELECTRICAL ELECTRONICS ENGINEERS INC
DOI: 10.1109/LPT.2004.828497

关键词

optical interconnects; optical telecommunications; optical waveguide; propagation loss; roughness; silicon-on-insulator (SOI)

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Silicon-on-insulator (SOI) optical waveguides with high electromagnetic field confinement suffer from sidewall roughness which is responsible for strong scattering effects. This letter reports a numerical investigation on the size influence of ultrasmall SOI waveguides on the propagation loss due to sidewall roughness. It is shown that for a size smaller than 260 x 260 nm the roughness-induced propagation loss decreases. As the optical mode confinement is reduced, a very low loss light coupling from and to a single-mode fiber can be achieved with propagation loss as low as 0.5 dB/cm for a 150 x 150 nm cross-sectional waveguide.

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