4.7 Article

Adsorption kinetics of NO on ordered mesoporous carbon (OMC) and cerium-containing OMC (Ce-OMC)

期刊

APPLIED SURFACE SCIENCE
卷 317, 期 -, 页码 26-34

出版社

ELSEVIER
DOI: 10.1016/j.apsusc.2014.08.067

关键词

Ordered mesoporous carbon (OMC); NO adsorption; Ce-OMC; Adsorption kinetics

资金

  1. National Natural Science Foundation of China [51125025]
  2. Hi-tech Research and Development Program of China (863 Program) [2013AA065401]
  3. Key Innovation Team for Science and Technology of Zhejiang Province [2011R50017]
  4. Shanghai Tongji Gao Tingyao Environmental Science AMP
  5. Technology Development Foundation

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Ordered mesoporous carbon ( OMC) and cerium-containing OMC (Ce-OMC) were prepared using evaporation-induced self-assembly (EISA) method and used to adsorb NO center dot N-2 sorption, X-ray diffraction (XRD) and transmission electron microscopy (TEM) were used to confirm their structures. The results showed that the ordered and uniform structures were successfully synthesized and with the introduction of cerium pore properties were not significantly changed. The NO adsorption capacity of OMC was two times larger than that of activated carbon (AC). With the introduction of cerium both the adsorption capacity and the adsorption rate were improved. The effects of residence time and oxygen concentration on NO adsorption were also investigated. Oxygen played an important role in the NO adsorption (especially in the form of chemisorption) and residence time had small influence on the NO adsorption capacity. The NO adsorption kinetics was analyzed using pseudo-first-order, pseudo-second-order, Elovich equation and intraparticle diffusion models. The results indicated that the NO adsorption process can be divided into rapid adsorption period, slow adsorption period, and equilibrium adsorption period. The pseudo-second-order model was the most suitable model for NO adsorption on OMC and Ce-OMC. The rate controlling step was the intraparticle diffusion together with the adsorption reaction. (C) 2014 Elsevier B.V. All rights reserved.

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