期刊
ULTRAMICROSCOPY
卷 100, 期 1-2, 页码 9-23出版社
ELSEVIER SCIENCE BV
DOI: 10.1016/j.ultramic.2004.01.005
关键词
wave optics; high-resolution electron holography; coherent wave aberration; non-isoplanicity; tilted illumination; phase curvature
类别
In high-resolution off-axis electron holography, the interpretable lateral resolution is extended up to the information limit of the electron microscope by means of a correcting phase plate in Fourier space. A plane illuminating electron wave is generally assumed. However, in order to improve spatial coherence, which is essential for holography, the object under investigation is illuminated with an elliptically shaped electron source. This special illumination imposes a variation of beam directions over the field of view. Therefore, due to the interaction of beam tilt and coherent wave aberration, the effective aberrations vary over the field of view yielding a loss of isoplanicity. Consequently, in the past the aberrations were only corrected successfully for a small part of the field of view. However, a thorough analysis of the holographic imaging process shows that the imaging artifacts introduced by the elliptical illumination can be corrected under reconstruction by means of a phase curvature, which models the illuminating wave front. Applied in real space, this phase curvature is seamlessly incorporated into the correction process for coherent wave aberration resulting in an improvement of interpretable lateral resolution up to the information limit for the whole field of view. (C) 2004 Elsevier B.V. All rights reserved.
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