期刊
APPLIED SURFACE SCIENCE
卷 256, 期 23, 页码 7077-7082出版社
ELSEVIER
DOI: 10.1016/j.apsusc.2010.05.030
关键词
Citric acid; WO3 thin films; Polymeric precursor method; Photoelectrochemistry
类别
资金
- National High Technology Research and Development Program of China (863 Program) [2007A06Z129]
- Key Research Project in Science &Technology Program of Hunan Province, China [2008SK1001]
Effect of citric acid (CA) on microstructure and photoelectrochemical properties of WO3 films prepared by the polymeric precursor method was investigated. The obtained materials were characterized by means of X-ray diffraction (XRD), field-emission scanning electron microscopy (FESEM), and high-resolution transmission electron microscopy (HRTEM). The results showed that samples prepared with adding different amounts of citric acid had a pure phase of cubic. The addition of citric acid could significantly increase the particle size and change the surface of WO3 films. The photoelectrochemical measurements were performed using a standard three-electrode system cell. The films prepared from mass ratios of CA/PEG (R = 0, 0.2, 0.4, 0.6 and 1) showed 1.0, 1.4, 1.7, 2.1 and 0.9 mA cm(-2) at 1.2 V under illumination with a 500 W xenon lamp (I-0 = 100 mW/cm(2)), respectively. (C) 2010 Elsevier B.V. All rights reserved.
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