4.7 Article

Passivation of aluminum with alkyl phosphonic acids for biochip applications

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APPLIED SURFACE SCIENCE
卷 256, 期 23, 页码 7146-7150

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ELSEVIER
DOI: 10.1016/j.apsusc.2010.05.041

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Biosenor; DNA metallic microarray; Phosphonic acid self-assembled monolayer

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Self-assembly of decylphosphonic acid (DPA) and octadecylphosphonic acid (ODPA) was studied on aluminum films using XPS, ToF-SIMS and surface wettability. Modified aluminum films were tested for passivation against silanization and subsequent oligonucleotide attachment. Passivation ratios of at least 450: 1 compared to unprotected aluminum were obtained, as quantified by attachment of radio-labeled oligos. (C) 2010 Elsevier B.V. All rights reserved.

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