期刊
APPLIED SURFACE SCIENCE
卷 256, 期 5, 页码 1436-1442出版社
ELSEVIER SCIENCE BV
DOI: 10.1016/j.apsusc.2009.08.104
关键词
CuS; Microwave assisted chemical bath deposition; Thin films
类别
资金
- Natural Science Foundation of Beijing [4082008]
- Scientific and Technological Development Project of Beijing Education Committee [KM200710005029]
- Opening Project of State Key Laboratory of Green Building Materials [GBM-08-KF104]
In this study, oriented CuS nanoplates standing perpendicularly on F:SnO2 (FTO) coated glass substrates have been prepared through a mild microwave assisted chemical bath deposition process in which copper acetate reacted with ethylenediamine tetraacetate acid disodium and thioacetamide in aqueous solution within 40 min. The effects of reaction time and microwave radiation on the treatment process were investigated. The morphology, structure, and composition of the yielded nanostructures have been confirmed by X-ray diffraction (XRD), energy-dispersive X-ray analysis (EDX), and scanning electron microscope (SEM). Also, the correlation between the reflectance, transmittance coefficient in the UV and the thickness of films was established. Furthermore, a two-point probe was used for resistivity measurements. We believe this simple chemical conversion technique can be further extended to the synthesis of other semiconductors with various morphologies. (C) 2009 Elsevier B.V. All rights reserved.
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