期刊
APPLIED SURFACE SCIENCE
卷 255, 期 5, 页码 2885-2889出版社
ELSEVIER
DOI: 10.1016/j.apsusc.2008.08.045
关键词
Anti-adhesive; Self-assembled monolayer; FDTS; UV-nanoimprint lithography
类别
资金
- China Postdoctoral Scientific Foundation [20070420105]
- National 973 Program [2007CB935400]
- Science and Technology Committee of Shanghai [0652nm052, 0752nm013, 0752nm014]
- Shanghai Postdoctoral Scientific [07R214204, 08R214211]
In nanoimprint lithography process, resist adhesion to the mold was usually self-assembled and a release agent on the mold surface to detach easily from the imprinted resist. In the paper, the commercially available silane, 1H,1H,2H,2H-perfluorodecyltrichlorosilane (CF3-(CF2)(7)-(CH2)(2)-SiCl3 or FDTS) was used to investigate the anti-adhesion for UV-nanoimprint lithography. A water contact angle as high as 113.11 was achieved by self-assembled monolayer (SAM) deposited on the quarter mold by vapor evaporation, which is desirable for a good anti-adhesion agent between the fused silica and the curing resist. The homogeneous monolayer was also evaluated by AFM and XPS. UV-NIL using FDTS-coated fused silica process good pattern transfer fidelity. It is shown that the FDTS is an excellent and promising release agent material for UV-nanoimprint lithography. (C) 2008 Elsevier B.V. All rights reserved.
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