期刊
SURFACE AND INTERFACE ANALYSIS
卷 36, 期 8, 页码 694-697出版社
JOHN WILEY & SONS LTD
DOI: 10.1002/sia.1738
关键词
roughness; adhesion; AFM; UHV; JKR model; surface energy
Adhesion measurements are presented which were carried out with an atomic force microscope between polymer balls attached to a cantilever and a silicon wafer under ultra high vacuum conditions. In using a silicon surface with a defined structure a correlation between adhesion force and contact area was found. This correlation could partly be explained by the Johnson-Kendall-Roberts model, if a change of the surface energy is assumed as a result of the structuring. For a constant geometric contact area an additional structuring leads to a decrease of the adhesion force. Copyright (C) 2004 John Wiley Sons, Ltd.
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