期刊
ADVANCED MATERIALS
卷 16, 期 15, 页码 1369-1373出版社
WILEY-V C H VERLAG GMBH
DOI: 10.1002/adma.200400593
关键词
-
This article briefly describes two recently developed soft-lithographic techniques that can be used to fabricate complex, well-defined three-dimensional (3D) nanostructures. The first relies on the single or multilayer transfer of thin solid 'ink' coatings from high-resolution rubber stamps. The second uses these stamps as conformable phase masks for proximity field nanopatterning of thin layers of transparent photopolymers. Although both techniques use the same pattern-transfer elements, they rely on completely different physical principles and they provide complementary patterning capabilities. The operational simplicity of the techniques, their ability to pattern large areas quickly, and the flexibility in the geometry of structures that can be formed with them suggest general utility for 3D nanomanufacturing.
作者
我是这篇论文的作者
点击您的名字以认领此论文并将其添加到您的个人资料中。
推荐
暂无数据