期刊
ADVANCED MATERIALS
卷 16, 期 15, 页码 1356-+出版社
WILEY-V C H VERLAG GMBH
DOI: 10.1002/adma.200400768
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A new application of the combination of soft lithography and solventless polymerization is described (see Figure)-the patterning of ultra-hard microstructures in selected areas using highly oriented polyacetylene (HOPA) films as a precursor. It is expected that this simple, low-cost, and mild process will lead to the formation of highly oriented films of other materials, e.g., electro-optically active polymers.
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