4.6 Article

Robust ferroelectricity in epitaxial Hf1/2Zr1/2O2 thin films

期刊

APPLIED PHYSICS LETTERS
卷 113, 期 8, 页码 -

出版社

AMER INST PHYSICS
DOI: 10.1063/1.5041715

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资金

  1. Spanish Ministry of Economy and Competitiveness, through the Severo Ochoa Programme for Centres of Excellence in RD [SEV-2015-0496]
  2. AEI/FEDER, UE [MAT2017-85232-R]
  3. Generalitat de Catalunya [2017 SGR 1377]
  4. RyC contract [RYC-2017-22531]
  5. China Scholarship Council (CSC) [201506080019]
  6. [MAT2014-56063-C2-1-R]
  7. [MAT2015-73839-JIN]

向作者/读者索取更多资源

Ferroelectric orthorhombic Hf0.5Zr0.5O2 thin films have been stabilized epitaxially on La2/3Sr1/3MnO3/SrTiO3(001) by pulsed laser deposition. The epitaxial orthorhombic films, (111)-oriented and with a very flat surface, show robust ferroelectric properties at room temperature. They present a remnant polarization around 20 mu C/cm(2) without the need of a wake-up process, a large coercive electric field of around 3 MV/cm, an extremely long retention extending well beyond 10 years, and an endurance up to about 10(8) cycles. Such outstanding properties in the nascent research on epitaxial HfO2-based ferroelectric films can pave the way for a better understanding of the effects of orientation, interfaces, strain, and defects on ferroelectricity in HfO2. Published by AIP Publishing.

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