4.6 Article

Effect of oxide/oxide interface on polarity dependent resistive switching behavior in ZnO/ZrO2 heterostructures

期刊

APPLIED PHYSICS LETTERS
卷 104, 期 19, 页码 -

出版社

AMER INST PHYSICS
DOI: 10.1063/1.4878402

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资金

  1. National Basic Research Program of China [2012CB932702]
  2. National Science Foundation of China [11174031, 51371024, 51325101, 51271020]
  3. PCSIRT
  4. Beijing Nova program [2011031]
  5. Fundamental Research Funds for the Central Universities

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The effect of oxide/oxide interface for controlling the migration process of oxygen vacancies (or oxygen ions) on resistive switching behaviors has been investigated by fabricating the ZrO2/ZnO oxide heterostructures. Completely different resistive switching behaviors are observed in the heterostructures with a set process under a different bias polarity. It is demonstrated that the change of the oxide/oxide interface barrier height determining the migration of oxygen vacancies (or oxygen ions) leads to the current direction-dependent resistive switching. Furthermore, the ZnO/ZrO2 heterostructure with the homogeneous resistive switching behavior could be potentially applied as a controllable and stable multistate memory by controlling reset-stop voltages. Our method opens up an opportunity to explore the resistive switching mechanism and develop resistance switching devices with specific functions through engineering oxide/oxide interfaces in oxide heterostructures. (C) 2014 AIP Publishing LLC.

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