期刊
APPLIED PHYSICS LETTERS
卷 104, 期 20, 页码 -出版社
AMER INST PHYSICS
DOI: 10.1063/1.4879283
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资金
- German Research Foundation (Deutsche Forschungsgemeinschaft) [MI 1247/11-1]
Ferroelectric hafnium oxide films were fabricated by chemical solution deposition with a remnant polarization of >13 mu C/cm(2). The samples were prepared with 5.2mol.% yttrium-doping and the thickness varied from 18nm to 70nm. The hafnium oxide layer was integrated into a metal-insulator-metal capacitor using platinum electrodes. Due to the processing procedure, no thickness dependence of the ferroelectric properties was observed. To confirm the ferroelectric nature of the deposited samples, polarization, capacitance, and piezoelectric displacement measurements were performed. However, no evidence of the orthorhombic phase was found which has been proposed to be the non-centrosymmetric, ferroelectric phase in HfO2. (C) 2014 AIP Publishing LLC.
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