期刊
THIN SOLID FILMS
卷 464, 期 -, 页码 146-149出版社
ELSEVIER SCIENCE SA
DOI: 10.1016/j.tsf.2004.06.072
关键词
tin film; silica glass substrate; single crystalline film; AFM; vacuum deposition
Atomic force microscopy (AFM) and X-ray diffraction (XRD) have been used to characterize surface structures of Sri thin films grown on SiO2 glass substrates. The surface morphology of the Sn thin films is found to be strongly dependent on the film thickness and the growth temperature. The 100-nm-thick Sri film grown at 330 K is mainly composed of flat-top islands with a grain size of 400 nm in diameter and shows the preferred orientation of the a-axis perpendicular to the substrate surface. (C) 2004 Elsevier B.V. All rights reserved.
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