期刊
APPLIED PHYSICS LETTERS
卷 102, 期 10, 页码 -出版社
AMER INST PHYSICS
DOI: 10.1063/1.4794903
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资金
- Grants-in-Aid for Scientific Research [24860018] Funding Source: KAKEN
We propose the use of indium tungsten oxide (IWO) as a channel material for thin-film transistors (TFTs). In the present study, an IWO film was deposited at room temperature by means of DC magnetron sputtering and then annealed at 100 degrees C in N-2 prior to formation of Au source and drain electrodes. Analysis using X-ray diffraction and transmission electron microscopy revealed that the film remained amorphous even after the post-deposition annealing treatment. TFTs fabricated using a Si substrate as a back-gate electrode showed good performance, with a saturation field-effect mobility of 19.3 cm(2).V-1.s(-1), an on/off current ratio of 8.9 x 10(9). (C) 2013 American Institute of Physics. [http://dx.doi.org/10.1063/1.4794903]
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