期刊
JOURNAL OF CRYSTAL GROWTH
卷 270, 期 3-4, 页码 301-308出版社
ELSEVIER SCIENCE BV
DOI: 10.1016/j.jcrysgro.2004.06.033
关键词
molecular beam epitaxy; superlattices; antimonides; arsenates; semiconducting III-V materials
We have investigated the cross-contamination of As in GaSb/InAs superlattices. We demonstrate a method of varying the lattice constant of the superlattice. By controlling the As background pressure in the growth chamber, the strain can be controlled to about 0.01%, corresponding to As cross-incorporation variations of about +/-1%. The distribution of As is investigated by X-ray diffraction and cross-sectional scanning tunneling microscopy, and the critical thickness is obtained. (C) 2004 Elsevier B.V. All rights reserved.
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