相关参考文献
注意：仅列出部分参考文献，下载原文获取全部文献信息。Incipient Ferroelectricity in Al-Doped HfO2 Thin Films
Stefan Mueller et al.
ADVANCED FUNCTIONAL MATERIALS (2012)
Ferroelectricity in Simple Binary ZrO2 and HfO2
Johannes Mueller et al.
NANO LETTERS (2012)
Emerging memories: resistive switching mechanisms and current status
Doo Seok Jeong et al.
REPORTS ON PROGRESS IN PHYSICS (2012)
Ferroelectricity in hafnium oxide thin films
T. S. Boescke et al.
APPLIED PHYSICS LETTERS (2011)
Ferroelectricity in yttrium-doped hafnium oxide
J. Mueller et al.
JOURNAL OF APPLIED PHYSICS (2011)
Hydrogen trapping in oxygen-deficient hafnium silicates
L. R. C. Fonseca et al.
JOURNAL OF APPLIED PHYSICS (2007)
Some mechanisms for the incorporation of hydrogen in Hf-based gate dielectric films on Si
C. Driemeier et al.
PHYSICA STATUS SOLIDI A-APPLICATIONS AND MATERIALS SCIENCE (2007)
Thermochemical behavior of hydrogen in hafnium silicate films on Si
C. Driemeier et al.
APPLIED PHYSICS LETTERS (2006)
HfO2 and Al2O3 gate dielectrics on GaAs grown by atomic layer deposition -: art. no. 152904
MM Frank et al.
APPLIED PHYSICS LETTERS (2005)
H-related defect complexes in HfO2:: A model for positive fixed charge defects
J Kang et al.
APPLIED PHYSICS LETTERS (2004)
Why is nonvolatile ferroelectric memory field-effect transistor still elusive?
TP Ma et al.
IEEE ELECTRON DEVICE LETTERS (2002)
Hydrogen impermeability of TiN films and its dependence on nitrogen concentration at high temperatures
T Nishikiori et al.
JOURNAL OF THE ELECTROCHEMICAL SOCIETY (2001)
分享论文
