Interlamellar silylation of H-kenyaite with 3-aminopropyltriethoxysilane

H-kenyaite was modified by interlayer surface silylation using 3-aminopropyltriethoxysilane and dodecylamine in ethanol without a pre-swelling step. Dodecylamine acts as a gallery expander and silylation catalyst. The evaporation of ethanol from the dispersion yields well-ordered silylated kenyaites with large basal spacings between 4.12 and 5.12 nm. Solid-state Si-29 MAS NMR of the silylated samples showed Q(3) and Q(4) Signals as well as T-2 and T-3 signals. The increase in the relative intensity of Q(4) for Q(3) and the appearance of T-2 and T-3 signals was attributed to the grafting of 3-aminopropyltriethoxysilane to the interlayer surface silanol groups. (C) 2004 Elsevier B.V. All rights reserved.