期刊
APPLIED PHYSICS LETTERS
卷 101, 期 11, 页码 -出版社
AMER INST PHYSICS
DOI: 10.1063/1.4752231
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资金
- NSFC [61204074]
Macroporous silicon with multiscale texture for reflection suppression and light trapping was achieved through a controllable electrochemical etching process. It was coated with TiO2 by atomic layer deposition, and used as the photoanode in photocatalytic water splitting. A conformal pn-junction was also built-in in order to split water without external bias. A 45% enhancement in photocurrent density was observed after black silicon etching. In comparison with nano-structured silicon, the etching process here has neither metal contamination nor requirement of vacuum facilities. (C) 2012 American Institute of Physics. [http://dx.doi.org/10.1063/1.4752231]
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