4.6 Article

Patterned oxide semiconductor by electrohydrodynamic jet printing for transparent thin film transistors

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APPLIED PHYSICS LETTERS
卷 100, 期 10, 页码 -

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AMER INST PHYSICS
DOI: 10.1063/1.3691177

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  1. National Research Foundation of Korea (NRF) (Global Research Laboratory (GRL) by Korean Ministry of Education, Science & Technology (MEST) [K2070400000307A050000310]
  2. CU (World Class University) through the National Research Foundation of Korea
  3. Ministry of Education, Science and Technology [R31-10092]

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This paper explores transport in transparent thin film transistors formed using a liquid precursor to indium zinc oxide, delivered to target substrates by electrohydrodynamic jet (e-jet) printing. Under optimized conditions, we observe field effect mobilities as high as 32 cm(2) V(-1)s(-1), with on/off current ratios of 10(3) and threshold voltages of 2 V. These results provide evidence that material manipulated in fine-jet, electric field induced liquid flows can yield semiconductor devices without any adverse effects of residual charge or unintentional doping. E-jet printing methods provide levels of resolution (similar to 1.5 mu m) that provide a path to printed transistors with small critical dimensions. (C) 2012 American Institute of Physics. [http://dx.doi.org/10.1063/1.3691177]

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