4.6 Article

AlGaN/GaN two-dimensional-electron gas heterostructures on 200 mm diameter Si(111)

相关参考文献

注意:仅列出部分参考文献,下载原文获取全部文献信息。
Article Physics, Applied

AlxGa1-xN/GaN heterostructures on a thin silicon-on-insulator substrate for metal-semiconductor-metal photodetectors

Vivian Kaixin Lin et al.

JOURNAL OF PHYSICS D-APPLIED PHYSICS (2011)

Proceedings Paper Physics, Applied

Improving GaN-on-silicon properties for GaN device epitaxy

A. Dadgar et al.

PHYSICA STATUS SOLIDI C: CURRENT TOPICS IN SOLID STATE PHYSICS, VOL 8, NO 5 (2011)

Proceedings Paper Optics

Growth of GaN/AlGaN on 200 mm diameter silicon (111) wafers by MOCVD

Adam R. Boyd et al.

PHYSICA STATUS SOLIDI C: CURRENT TOPICS IN SOLID STATE PHYSICS, VOL 6, SUPPL 2 (2009)

Article Engineering, Electrical & Electronic

Studies of AlGaN/GaN high-electron-mobility transistors on 4-in. diameter Si and sapphire substrates

S Arulkumaran et al.

SOLID-STATE ELECTRONICS (2005)

Article Physics, Applied

Stress control in GaN grown on silicon (111) by metalorganic vapor phase epitaxy

E Feltin et al.

APPLIED PHYSICS LETTERS (2001)

Article Physics, Applied

Metalorganic chemical vapor phase epitaxy of crack-free GaN on Si (111) exceeding 1 μm in thickness

A Dadgar et al.

JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS (2000)