4.6 Article

Graphene thickness-graded transistors with reduced electronic noise

期刊

APPLIED PHYSICS LETTERS
卷 100, 期 3, 页码 -

出版社

AMER INST PHYSICS
DOI: 10.1063/1.3676277

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资金

  1. Semiconductor Research Corporation (SRC)
  2. Defense Advanced Research Project Agency (DARPA) through FCRP Center on Functional Engineered Nano Architectonics (FENA)
  3. US National Science Foundation (NSF)
  4. US Office of Naval Research (ONR) [N00014-10-1-0224]
  5. US NSF at RPI
  6. NSF EAGER
  7. Russian Fund for Basic Research (RFBR) [11-02-00013]
  8. Div Of Industrial Innovation & Partnersh
  9. Directorate For Engineering [1134723] Funding Source: National Science Foundation

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The authors demonstrate graphene thickness-graded transistors with high electron mobility and low 1/f noise (f is a frequency). The device channel is implemented with few-layer graphene with the thickness varied from a single layer in the middle to few-layers at the source and drain contacts. It was found that such devices have electron mobility comparable to the reference single-layer graphene devices while producing lower noise levels. The metal doping of graphene and difference in the electron density of states between the single-layer and few-layer graphene cause the observed noise reduction. The results shed light on the noise origin in graphene. (C) 2012 American Institute of Physics. [doi:10.1063/1.3676277]

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