Formation of micromeshes by nickel silicide

Nanoscale mesh structures of nickel silicides have been grown on Si(001) surfaces. After cleaning the Si(001) surfaces in an ultra-high vacuum (UHV), nickel measuring approximately seven to eight monolayers in thickness is deposited on the surfaces. On gradually heating the surface above 760 degreesC, nickel silicides are grown on the surface, accompanied by highly dense etch pits. Self-assembled nano-scale meshes in the NiSi phase (wire size c.a. 20 nm) are nested over the etch pits having an average area of 1mum(2). (C) 2004 Elsevier B.V. All rights reserved.