期刊
APPLIED PHYSICS LETTERS
卷 100, 期 25, 页码 -出版社
AMER INST PHYSICS
DOI: 10.1063/1.4729479
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资金
- Japan Society for the Promotion of Science [24560025]
- Grants-in-Aid for Scientific Research [24560025] Funding Source: KAKEN
The kinetics of Al and N adatoms on reconstructed AlN(0001) surfaces under growth conditions is investigated by performing first-principles pseudopotential calculations. Our calculations reveal that the adsorption of Al adatom strongly depends on the surface reconstruction while its diffusion is not affected by the reconstruction: the adsorption of Al adatom on the surface under N-rich conditions is much easier than that under H-rich conditions. These results indicate that the growth of AlN during metal-organic vapor-phase epitaxy is prominent under N-rich conditions rather than H-rich conditions, consistent with experimentally reported growth rate difference. (C) 2012 American Institute of Physics. [http://dx.doi.org/10.1063/1.4729479]
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