4.6 Article

The influence of gate dielectrics on a high-mobility n-type conjugated polymer in organic thin-film transistors

期刊

APPLIED PHYSICS LETTERS
卷 100, 期 3, 页码 -

出版社

AMER INST PHYSICS
DOI: 10.1063/1.3678196

关键词

-

资金

  1. Research Grants Council (RGC) of Hong Kong, China [PolyU5330/08E, CUHK02/CRF/08]
  2. Hong Kong Polytechnic University [A-PB0M]

向作者/读者索取更多资源

Organic thin-film transistors based on a high mobility n-type semiconductor poly{[n,n9-bis(2-octyldodecyl)-naphthalene-1,4,5,8-bis(dicarboximide)-2,6-diyl]-alt-5,59-(2,29-bithiophene)} P(NDI2OD-T2) and different polymer gate dielectrics are fabricated. The average electron mobility decreases from 0.76 to 0.08 cm(2)/Vs with the increase of the gate dielectric constant from 2.6 to 7.8. The P(NDI2OD-T2) film shows unconventional face-on molecular packing, which results in short distances and pronounced interactions between electrons and gate dielectric. Therefore, the decrease of the electron mobility with the increasing dielectric constant is attributed to the Frohlich polaron effect for the interaction between electrons in the channel and ionic polarization cloud in the gate dielectric. (C) 2012 American Institute of Physics. [doi:10.1063/1.3678196]

作者

我是这篇论文的作者
点击您的名字以认领此论文并将其添加到您的个人资料中。

评论

主要评分

4.6
评分不足

次要评分

新颖性
-
重要性
-
科学严谨性
-
评价这篇论文

推荐

暂无数据
暂无数据