4.4 Article

Structural analysis of CdO layers grown on r-plane sapphire (0112) by metalorganic vapor-phase epitaxy

期刊

JOURNAL OF CRYSTAL GROWTH
卷 271, 期 1-2, 页码 223-228

出版社

ELSEVIER SCIENCE BV
DOI: 10.1016/j.jcrysgro.2004.07.069

关键词

high-resolution x-ray diffraction; metalorganic-vapor phase epitaxy; oxides; semiconducting II-VI materials

向作者/读者索取更多资源

High-quality fully relaxed CdO layers have been grown directly on r-plane sapphire by metalorganic vapor-phase epitaxy. The crystalline structure has been analyzed by high-resolution X-ray diffraction. The structural quality of the (001) oriented layers degrades as the growth temperature decreases, process which is accompanied by the appearance of pyramidal grains as revealed by scanning force microscopy. The lattice parameters, perpendicular and parallel to the sample surface, have been determined by means of reciprocal space maps taken on asymmetrical reflections and measurements of symmetrical reflections at different azimuths. The epitaxial relationships between the CdO layer and the sapphire substrate have been deduced from the recorded pole figures. The quality of these CdO layers paves the way for a new development on the heteroepitaxial growth of other II-VI oxides on sapphire in addition to ZnO. (C) 2004 Elsevier B.V. All rights reserved.

作者

我是这篇论文的作者
点击您的名字以认领此论文并将其添加到您的个人资料中。

评论

主要评分

4.4
评分不足

次要评分

新颖性
-
重要性
-
科学严谨性
-
评价这篇论文

推荐

暂无数据
暂无数据