4.6 Article

Hysteretic behavior of the charge injection in single silicon nanoparticles

期刊

APPLIED PHYSICS LETTERS
卷 85, 期 16, 页码 3546-3548

出版社

AMER INST PHYSICS
DOI: 10.1063/1.1808889

关键词

-

向作者/读者索取更多资源

Charge injection in individual silicon nanoparticles has been investigated by electric force microscopy (EFM). Stored charges injected from the EFM tip have been counted using a quantitative method. Injection kinetics reveals the setting-up of an equilibrium regime. Equilibrium charge-voltage characteristics are analyzed, and display an overall linear behavior corresponding to successive tunneling through the nonequivalent tip-nanoparticle and nanoparticle-substrate oxide barriers. A hysteretic behavior is observed in the equilibrium charge-voltage characteristics, and attributed to a secondary charge injection process associated with the nanoparticle oxide surface. (C) 2004 American Institute of Physics.

作者

我是这篇论文的作者
点击您的名字以认领此论文并将其添加到您的个人资料中。

评论

主要评分

4.6
评分不足

次要评分

新颖性
-
重要性
-
科学严谨性
-
评价这篇论文

推荐

暂无数据
暂无数据