4.6 Article

Electric field-tunable BaxSr1-xTiO3 films with high figures of merit grown by molecular beam epitaxy

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APPLIED PHYSICS LETTERS
卷 101, 期 25, 页码 -

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AMER INST PHYSICS
DOI: 10.1063/1.4773034

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  1. Northrop Grumman through the ONR Chip Scale Channelizer Program
  2. AFSOR MURI program [FA9550-12-1-0038]
  3. Elings fellowship
  4. MRSEC Program of NSF [DMR 1121053]
  5. NSF

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We report on the dielectric properties of BaxSr1-xTiO3 (BST) films grown by molecular beam epitaxy on epitaxial Pt bottom electrodes. Paraelectric films (x <= 0.5) exhibit dielectric losses that are similar to those of BST single crystals and ceramics. Films with device quality factors greater than 1000 and electric field tunabilities exceeding 1: 5 are demonstrated. The results provide evidence for the importance of stoichiometry control and the use of a non-energetic deposition technique for achieving high figures of merit of tunable devices with BST thin films. (C) 2012 American Institute of Physics. [http://dx.doi.org/10.1063/1.4773034]

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