4.6 Article

Polarization-induced remote interfacial charge scattering in Al2O3/AlGaN/GaN double heterojunction high electron mobility transistors

期刊

APPLIED PHYSICS LETTERS
卷 100, 期 13, 页码 -

出版社

AMER INST PHYSICS
DOI: 10.1063/1.3698391

关键词

-

资金

  1. National Natural Science Foundation of China [60976070]
  2. Fundamental Research Funds for the Central Universities of China [2011YJS282]
  3. Beijing Jiaotong University, China

向作者/读者索取更多资源

This study investigated on polarization-induced remote interfacial charge scattering, a scattering mechanism caused by the interfacial polarization charge, for Al2O3/AlGaN/GaN double heterojunction high electron mobility transistors (HEMTs). Results show that remote interfacial charge scattering plays a critical role in the mobility of two-dimensional electron gas (2DEG) in thin barrier HEMTs. The electronic mobility limited by remote charge scattering is found to be a function of the fixed charge density induced by the Al2O3 layer, 2DEG density, and barrier thickness. Results of this study can be used in designing structures to generate higher electron mobility in Al2O3/AlGaN/GaN double heterojunction HEMTs. (C) 2012 American Institute of Physics. [http://dx.doi.org/10.1063/1.3698391]

作者

我是这篇论文的作者
点击您的名字以认领此论文并将其添加到您的个人资料中。

评论

主要评分

4.6
评分不足

次要评分

新颖性
-
重要性
-
科学严谨性
-
评价这篇论文

推荐

暂无数据
暂无数据