4.6 Article

New approach to nanocomposites of polyimides containing polyhedral oligomeric silsesquioxane for dielectric applications

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MATERIALS LETTERS
卷 58, 期 29, 页码 3716-3719

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ELSEVIER
DOI: 10.1016/j.matlet.2004.08.001

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dielectrics; nanocomposites; POSS; graft polymerization; polyimide

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Low dielectric constant nanocomposites of polyintides with grafted methacrylate side chains containing polyhedral oligomeric silsesquioxane (POSS) were successfully synthesized by thermally initiated free-radical graft copolymerization of methacrylcyclopentyl-POSS (MA-POSS) with the ozone-preactivated poly(arnic acid), followed by thermal imidization. The dielectric constant of the film can be tuned by varying the molar ratio of the grafted MA-POSS side chains in the copolymer. (C) 2004 Elsevier B.V. All rights reserved.

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