期刊
APPLIED PHYSICS LETTERS
卷 99, 期 26, 页码 -出版社
AMER INST PHYSICS
DOI: 10.1063/1.3672045
关键词
evaporation; nanofabrication; nanolithography; nanostructured materials; numerical analysis; plasmonics; surface enhanced Raman scattering
资金
- Swiss Federal Foundation
We report a high-throughput method for the fabrication of metallic nanogap arrays with high-accuracy over large areas. This method, based on shadow evaporation and interference lithography, achieves sub-10 nm gap sizes with a high accuracy of +/- 1.5 nm. Controlled fabrication is demonstrated over mm(2) areas and for periods of 250 nm. Experiments complemented with numerical simulations indicate that the formation of nanogaps is a robust, self-limiting process that can be applied to wafer-scale substrates. Surface-enhanced Raman scattering (SERS) experiments illustrate the potential for plasmonic sensing with an exceptionally low standard-deviation of the SERS signal below 3% and average enhancement factors exceeding 1 x 10(6). (C) 2011 American Institute of Physics. [doi: 10.1063/1.3672045]
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