Growth of [010] oriented α-MoO3 nanorods by pulsed electron beam deposition

Arrays of vertically aligned, [010] oriented alpha-MoO3 nanorods were grown on planar silicon substrates by pulsed electron beam deposition. The morphology and structure of the nanorods as well as their growth mechanism were investigated. These [010] oriented nanorods exhibited a good field emission performance with a turn-on field of 3.6 V/mu m. As the space between layers of the [010] oriented nanorods is large, their formation may be also meaningful for exploring the gas sensing and energy storage properties of layered oxides like alpha-MoO3. (C) 2011 American Institute of Physics. [doi:10.1063/1.3664779]