4.6 Article

Graphene based Schottky junction solar cells on patterned silicon-pillar-array substrate

期刊

APPLIED PHYSICS LETTERS
卷 99, 期 23, 页码 -

出版社

AMER INST PHYSICS
DOI: 10.1063/1.3665404

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资金

  1. China NSF [61025021, 60936002, 60729308, 51072089, 61011130296, 61020106006]
  2. National Key Projects of Science and Technology [2009ZX02023-001-3, 2011ZX02403-002]
  3. Tsinghua National Laboratory for Information Science and Technology (TNList) Cross-discipline Foundation
  4. Foundation of State Key Laboratory of Electronic Thin Films and Integrated Devices
  5. University of Electronic Science and Technology of China, Chengdu [KFJJ200904]
  6. Ministry of Science and Technology of China [2008DFA12000]

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Graphene-on-silicon Schottky junction solar cells were prepared with pillar-array-patterned silicon substrate. Such patterned substrate showed an anti-reflective characteristic and led to an absorption enhancement of the solar cell, which showed enhanced performance with short-circuit current density, open-circuit voltage, fill factor, and energy conversion efficiency of 464.86 mV, 14.58 mA/cm(2), 0.29, and 1.96%, respectively. Nitric acid was used to dope graphene film and the cell performance showed a great improvement with efficiency increasing to 3.55%. This is due to the p-type chemical doping effect of HNO3 which increases the work function and the carrier density of graphene. (C) 2011 American Institute of Physics. [doi:10.1063/1.3665404]

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