期刊
APPLIED PHYSICS LETTERS
卷 99, 期 11, 页码 -出版社
AMER INST PHYSICS
DOI: 10.1063/1.3638490
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资金
- National Science Council (NSC) of Taiwan [NSC-98-2221-E-182-056-MY3]
In this study, we reported the forming-free resistive switching behavior in the Ru/RE2O3/TaN (RE = Nd, Dy, and Er) memory devices using thin Nd2O3, Dy2O3, and Er2O3 films fabricated with full room temperature process. The dominant conduction mechanisms of the Ru/RE2O3/TaN devices in the low-resistance state and high-resistance state are Ohmic behavior. The Ru/Dy2O3/TaN memory device exhibited high resistance ratio, nondestructive readout, reliable data retention, and good endurance. Ru/Dy2O3/TaN memory device has a great potential for the application in nonvolatile resistive switching memory. (C) 2011 American Institute of Physics. [doi:10.1063/1.3638490]
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