4.6 Article

Third harmonic generation at 223 nm in the metallic regime of GaP

期刊

APPLIED PHYSICS LETTERS
卷 98, 期 11, 页码 -

出版社

AMER INST PHYSICS
DOI: 10.1063/1.3565240

关键词

-

资金

  1. Army Research Office [W911NF-10-2-0105]
  2. National Research Council

向作者/读者索取更多资源

We demonstrate second and third harmonic generation from a GaP substrate 500 mu m thick. The second harmonic field is tuned at the absorption resonance at 335 nm, and the third harmonic signal is tuned at 223 nm, in a range where the dielectric function is negative. These results show that a phase locking mechanism that triggers transparency at the harmonic wavelengths persists regardless of the dispersive properties of the medium, and that the fields propagate hundreds of microns without being absorbed even when the harmonics are tuned to portions of the spectrum that display metallic behavior. (C) 2011 American Institute of Physics. [doi: 10.1063/1.3565240]

作者

我是这篇论文的作者
点击您的名字以认领此论文并将其添加到您的个人资料中。

评论

主要评分

4.6
评分不足

次要评分

新颖性
-
重要性
-
科学严谨性
-
评价这篇论文

推荐

暂无数据
暂无数据