4.6 Article

Effect of dislocation density on thermal boundary conductance across GaSb/GaAs interfaces

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APPLIED PHYSICS LETTERS
卷 98, 期 16, 页码 -

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AMER INST PHYSICS
DOI: 10.1063/1.3581041

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  1. LDRD office through the Sandia National Laboratories
  2. National Science Foundation
  3. Sandia National Laboratories
  4. United States Department of Energy's National Nuclear Security Administration [DE-AC04-94AL85000]

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We report on the thermal boundary conductance across structurally-variant GaSb/GaAs interfaces characterized by different dislocations densities, as well as variably-rough Al/GaSb interfaces. The GaSb/GaAs structures are epitaxially grown using both interfacial misfit (IMF) and non-IMF techniques. We measure the thermal boundary conductance from 100 to 450 K with time-domain thermoreflectance. The thermal boundary conductance across the GaSb/GaAs interfaces decreases with increasing strain dislocation density. We develop a model for interfacial transport at structurally-variant interfaces in which phonon propagation and scattering parallels photon attenuation. We find that this model describes the measured thermal boundary conductances well. (C) 2011 American Institute of Physics. [doi: 10.1063/1.3581041]

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