期刊
APPLIED PHYSICS LETTERS
卷 96, 期 5, 页码 -出版社
AMER INST PHYSICS
DOI: 10.1063/1.3293301
关键词
electron beam lithography; magnetic domains; magnetic recording; magnetic switching; polymer blends; self-assembly; synchronisation
Electron-beam (E-beam) directed assembly, which combines the long-range phase and placement registration of e-beam lithography with the sharp dot size and spacing uniformity of block copolymer self assembly, is considered highly promising for fabricating templates that meet the tight magnetic specifications required for write synchronization in bit patterned media magnetic recording systems. In our study, we show that this approach also yields a narrower magnetic switching field distribution (SFD) than e-beam patterning or block copolymer self-assembly alone. We demonstrate that the pattern uniformity, i.e., island diameter and placement distributions are also important for achieving tight magnetic SFDs.
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