期刊
APPLIED PHYSICS LETTERS
卷 97, 期 1, 页码 -出版社
AMER INST PHYSICS
DOI: 10.1063/1.3457994
关键词
carrier density; electron mobility; pulsed laser deposition; semiconductor epitaxial layers; semiconductor growth; strontium compounds; vacancies (crystal)
We report bulk-quality n-type SrTiO3 (n-SrTiO3) thin films fabricated by pulsed laser deposition, with electron mobility as high as 6600 cm(2) V-1 s(-1) at 2 K and carrier density as low as 2.0x10(18) cm(-3) (similar to 0.02 at. %), far exceeding previous pulsed laser deposition films. This result stems from precise strontium and oxygen vacancy defect chemistry management, providing a general approach for defect control in complex oxide heteroepitaxy. (C) 2010 American Institute of Physics. [doi:10.1063/1.3457994]
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